ASML is on track to ship the industry's first extreme ultraviolet (EUV) lithography scanner with a 0.55 numerical aperture (NA) this year. Company CEO Peter Wennink said that ASML's Twinscan EXE:5000 ...

ASML has just officially shipped its very first High-NA EUV lithography scanner to Intel, with the sparkling new Twinscan EXE:5000 extreme ultraviolet (EUV) scanner being the first High-NA scanner ...

B, the first High-NA EUV lithography tool designed for commercial production, reiterating Intel's plans to use High-NA EUV patterning for 14A process technology and onwards.

According to a report from Tom's Hardware, China's so-called "Frankenstein" EUV scanner was assembled from mismatched parts sourced through various channels, potentially including surplus equipment ...

ASML has delivered a first-generation Twinscan EXE:5000 High-NA extreme ultraviolet (EUV) lithography scanner to Intel, seven years after Intel first ordered the machine. The High numerical aperture ...

The semiconductor industry is moving full speed ahead to develop high-NA EUV, but bringing up this next generation lithography system and the associated infrastructure remains a monumental and ...

The top three foundries plan to implement high-NA EUV lithography as early as 2025 for the 18 angstrom generation, but the replacement of single exposure high-NA (0.55) over double patterning with ...

Belgium-based semiconductor research institute Imec will present its latest achievements that enable high-numerical aperture (High-NA) extreme ultraviolet (EUV) lithography at the 2024 Advanced ...

Research and innovation hub imec has produced patterned structures obtained after exposure with the 0.55NA EUV scanner in the joint ASML-imec High NA EUV Lithography Lab in Veldhoven, the Netherlands.

The semiconductor equipment giant ASML and electronics research center imec have opened a joint laboratory dedicated to high-numerical aperture (high-NA) extreme ultraviolet (EUV) lithography, seen by ...